Deposition Of Multilayered Titanium Thin Film By ND:YAG Laser Ablation

The Minerals, Metals and Materials Society
T. Nakamura
Organization:
The Minerals, Metals and Materials Society
Pages:
7
File Size:
223 KB
Publication Date:
Jan 1, 2003

Abstract

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TiO2 and Ti/TiO2 thin films were deposited on a quartz substrate by laser ablation of TiO2 and Ti targets using Nd:YAG pulsed laser. After sulfurization of the TiO2 film in H2S or CS2 gas at 1273 K for I hour, the surface atomic structure was changed. Furthermore, the Tirri02 film was successfully prepared by the subsequent ablation of Ti and Ti02 targets. The morphology and structure of the films were characterized by XRD, XPS and AFM analyses.
Citation

APA: T. Nakamura  (2003)  Deposition Of Multilayered Titanium Thin Film By ND:YAG Laser Ablation

MLA: T. Nakamura Deposition Of Multilayered Titanium Thin Film By ND:YAG Laser Ablation . The Minerals, Metals and Materials Society, 2003.

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