Discussions - Institute of Metals Division

R. W. Balluffi (Atomic Energy Div., Sylvania Electric Products Inc., Bayside, N. Y.)—Since porosity is known to form in the copper side of Cu-Ni couples during diffusion24,25 it is of importance to consider this factor in interpreting the large variations of chemical diffusivity with copper concentration reported for this system. The presence of porosity may affect the measurement of D in two ways: 1—density changes in the couple invalidate the usual solutions of the diffusion equation, and 2—the pores may act as short-circuiting paths when transport through the vapor or along internal surfaces is appreciable or else as open circuits when these effects are small. The error produced by the first effect may be estimated by a graphical analysis. Fig. 8 shows the porosity generated in the copper side of the Kirkendall interface of a pure nickel vs pure copper couple after diffusion for 350 hr at 1040°C in hydrogen. In Fig. 9 the actual diffusion curve which would be obtained by the usual slicing technique is shown as a solid line drawn to the same scale (from the data of da Silva and Mehl"). The amounts of porosity (obtained by lineal analysis) and of nickel are graphically represented by the hatched areas. The standard solutions of the diffusion equation are valid only when all volume elements of unit length and unit cross section contain equal numbers of atoms." It is possible to correct the experimental curve to satisfy this condition by shrinking the couple in the direction of diffusion in such a way as to eliminate the porosity.* The corrected diffusion curve obtained after