Electrowinning of Manganese from Sulphate Solutions in the Presence of Organic Additives

Manganese is a difficult metal to electrodeposit due to its high electronegativity and continues to possess unique process challenges. Manganese deposits of high quality are electrodeposited on 316 grade stainless steel from sulphate solutions in the presence of organic additives such as tetra ethyl ammonium bromide (TEABr), tetra propyl ammonium bromide (TPABr), and tetra butyl ammonium bromide (TBABr). The concentrations of these additives were examined over a relatively broad range to evaluate their effect on current efficiency, specific energy consumption and deposit morphology of the electrodeposited manganese metal. A maximum current efficiency of 68% was achieved in the presence of TEABr in the bath. X- ray diffraction studies revealed that (330) (411) planes were the most preferred planes of crystal growth during manganese electrowinning at a current density of 500 A/m2 resembling alpha-manganese irrespective of the nature of additive. Scanning electron micrographs showed smooth and uniform deposit morphologies when manganese was electrodeposited in the presence of TEABr.