Institute of Metals Division - Oxidation Kinetics of Tantalum in Carbon Dioxide

The oxidation rates of tantalum in various partial pressures of carbon dioxide in the temperature range 700°to 950°C were measured with a thermo-gravimetric balance. Oxidation involved a surface -controlled reaction associated with the formation of a nonprotective layer of Ta2O5. Below about 720°C, there was a change in the rate-determining mechanism, and above 830°C the linear rate was preceded by a complex region of nonlinear oxidation behavior. The linear oxidation of tantalum has been explained quantitatively in terms of carbon dioxide adsorption, followed by a rate-controlling surface reaction. The initial adsorption has been expressed both as an equilibrium process and as a steady-state reaction. The enthalpy for chemisorption of CO, was determined to be -17.3 kcal per mole. The surface-controlled reaction had an activation enthalpy of 40.4 kcal per mole. A considerable amount of interest has been shown in recent years in the oxidation of tantalum and the nature of the oxide film produced. This interest is associated with the increasing demand in our technology for structural materials to withstand high temperatures and corrosive atmospheres. The low oxidation resistance of tantalum has severely restricted its application as a high-strength, high-temperature material. As a fundamental approach to the realization of the full poten- tials of this metal, the kinetics of the oxidation of tantalum in oxygen and air have been extensively studied; however, very little work has been reported on the effect of other gases, including carbon dioxide. According to Miller,' the only reported study of the reaction between tantalum and dry carbon dioxide is a restricted observation by O'Driscoll et al.2 at 8 atm absolute pressure and 500°C. Therefore, this study was made to investigate the reaction of tantalum with carbon dioxide. EXPERIMENTAL MATERIALS AND METHODS The vacuum-annealed tantalum used in this study was obtained from Fansteel Metallurgical Corp. as 0.025-mm-thick sheet stock. This material had less than 0.1 pct total impurities, and the maximum individual impurity concentrations were