Jet Vapor Deposited Aluminum-Aluminum Oxide Nanolaminates

"The microstructure and mechanical properties of Al/AI2O 3 metal-oxide nanolaminates fabricated by' a novel Jet Vapor Deposition (JVD) process at substrate temperatures of ~25° and -250°C have been investigated using transmission electron microscopy (TEM) and nanoindentation methods. The thickness of the oxide layer was held constant between 2 and 5 nm, whilst the Al layer thickness was systematically varied from -3 to -50 nm. Continuity of the Al layers was significantly improved when the nanolaminates were deposited at an elevated substrate temperature (-250°C). The yield strength of the nanolamintes with Al layers greater than -25 nm follows a Hall-Petch type relationship, whereas that of the nanolaminates with Al layers less than -25 nm is better predicted by a Koehler-Lehoczky strengthening model. IntroductionAluminum-aluminum oxide (presumably A12O3) nanolaminates have been recently fabricated using a novel Jet Vapor Deposition (ND) process developed and patented by Jet Process Corporation [1-4]. ND uses sonic, high purity helium (He) gas jets to entrain atomically dispersed vapor and deposit films. It is of interest here because it can deposit multilayered structures (laminates) inexpensively at high rates. Materials with a thin, multilayer structure are of interest because they potentially offer novel mechanical and physical properties [5]. Koehler in 1970 used an image force model to investigate the strength of laminated materials and proposed the use of alternating layers of high and low shear modulus metals to produce high strength composite materials [6]. He predicted that dislocations would have to overcome a large repulsive image force in order to move from metal layer B of lower shear modulus (uB) into metal layer A of higher shear modulus (uA)' The image force (F) is given by the relation:"