Low Temperature CVD of Tungsten Carbide

Chemical vapor deposition of tungsten carbide on the surface of steel has been investigated at temperatures between 400 and 550C in an atmosphere containing tungsten hexafluoride, hydrogen and benzene. The tungsten fluoride flow rate was maintained at 20 ml/min. The hydrogen flow rate was at 100 ml/min. The benzene concentration varied from 1.15 to 5.56% in the reaction gas. It was observed that the higher the temperature, the faster the deposition rate for tungsten carbide. But the dependence of the deposition rate on the benzene concentration was not systematic. From the x-ray diffraction analysis, it was observed that W, W2C and WC are all presented in the coating. The amount of each phase presented in the coating depends on the temperature and, to a less extent, on the benzene concentration. The microhardness measurement has also been done for all CVD carbide coatings obtained in this study.