New Methods For In-Situ Remediation Of Metals-Contaminated Groundwater

New methods for remediating metals-contaminated groundwater include in-situ emplacement of highly adsorptive substrates to permanently retard solutes. Substrates are introduced by sequential injection of soluble components that precipitate in the aquifer, forming a permanent high-retardation zone. This method overcomes the factors that limit pump-and-treat remediation; i.e, long-term source loading and slow desorption. Column tests demonstrated efficient substrate emplacement, increasing retardation coefficients of Cr(VI) by 20 and As(V) by 40. Similar effectiveness is expected for other heavy metals. Simulations using a coupled advective-geochemical model accurately matched substrate emplacement and arsenic attenuation, allowing extrapolation to other constituents and larger-scale applications.