Oxide, Nitride & Compound Coatings on Strip Steel Via Activated Reactive Evaporation (Are)

"Oxide, nitride and other compound coatings often do not have adequate properties for newer applications when produced using very high deposition rates and simple evaporation techniques. Solar control, abrasion resistance, low reflectance and barrier effective engineered coatings require exacting properties. Such properties can be obtained by adapting the activated reactive evaporation (ARE) technology to Web production processes. Adaptions of the HAD and MAD processes will be described along with data on the high deposition rates obtained. These fast production capabilities were developed in order to make the processes economically competitive.IntroductionThe Physical Vapor Deposition technique (PVD) has been used to coat steel strip for over 20 years. (1) However, its use as a production process has been very limited because of the high cost of the PVD coating process and because, in some instances, the properties of the coating were not good enough to meet the customers requirements. Nevertheless, the PVD process has found wide application in the airplane engine and electronic component markets. These production processes have stimulated further development and advances in the technology.In 1971, Profession R. F. Bunshah developed the Activated Reactive Evaporation (ARE) process which was then used to produce hard coatings such as carbides, nitrides, oxides and other refractory compounds. (2) The process from a fundamental viewpoint -produces a coating on the substrate via the evaporation of metal in the presence of a low pressure (typically around 1 millitorr) of reactive gas, with a plasma created in the space between the metal source and the substrate.The plasma may be created by many means but its function is two-fold. First, it activates the reaction between the metal vapors and the reactive gas atoms/molecules resulting in the formation of a compound that deposits on the substrate. Second, because the plasma is in contact with the substrate, it results in a negative bias on the substrate and produces bombardment of the growing film with ions and energetic neutrals from the plasma. This bombardment causes many significant changes in the microstructure, properties and appearance of the coating.Recently another new technology Pulsed Magnetron Systems (PMS) has been introduced into PVD. This new technology has been pioneered in production scale equipment by Dr. S. Schiller (3) and associates. The use of a pulsed power supply on the magnetron prevents the problem of the anode being coated with a insulating layer which will then lead to micro and macro arcing producing defects in the coating."