Spectroscopic Methods for Control of Thin Film Growth

"Control of thin films during the growth process is dependent on several parameters that are difficult to monitor, including flux of film material, pressure, substrate temperature, composition, and thickness. One means for easing this difficulty is to take advantage of emission spectra associated with the process and the film. For pulsed laser deposition (PLD), the ion cloud generated by the laser has characteristic emission spectra that can be used to control the flux and, hence, the film. For chemical vapor deposition, the species present can be determined using mass spectroscopy and specific peaks can be used to control the deposition. Raman spectroscopy affords the possibility of real-time control by sensing characteristic peaks associated with film composition and thickness. These spectroscopic methods offer a real-time alternative to process control that is very attractive, because of the ability to accurately control films to achieve the engineered structures and properties sought. Examples are presented to illustrate the capabilities of these methods for thin film preparation.IntroductionThe drive to reduce costs and improve efficiencies of operation sets the tone for much of research, basic or applied. Basic research is limited by the ability of sensors and associated instrumentation to measure parameters accurately and reproducibly. Applied research has the same limitations and also the added constraints of time and costs. Hence, there are strong incentives to explore means for refining existing sensors with respect to performance and cost, as well as finding new sensors and techniques for more accurately and rapidly measuring quantities of interest in experiments and in various processes."