Technical Notes - Chemical Polishing of Pure Zinc

POLISHING pure zinc differs somewhat from polishing less reactive metals. The problem is not that of finding a suitable reagent, but rather of producing the polish in such a way that the surface remains polished after it is removed from the polishing bath. In other words., the anodic film that is vital to the polishing mechanism' must be tightly adherent and nonporous. It is usually desirable that it be thin. Polishing solutions consist of proper proportions of an acid and a strong oxidizing agent. In electro-polishing, the external circuit acts as the oxidizing agent. The proportions are critical because the essential surface film must be maintained at approximately constant thickness during the polishing process. In the case of zinc, chiefly two oxidizing agents, chromic and nitric acids, have been used. The simplest polishing reagent is concentrated nitric acid. However, it has certain disadvantages. It tends to pit: an excessive amount of heat is evolved during polishing; and the oxide film that it produces is not very stable, so that the polished sur-